Nanometer dimension photonic structure formation using interference litography

1. Goal

1.1. Make nanometer dimension photonic structures on photoresist

2. Tasks

2.1. Sample preparation

2.1.1. Surface cleaning

2.1.2. Photoresist application

2.1.3. Exposition by UV laser

2.2. Analyzation of properties

2.2.1. Scanning electron microcope photos

2.2.2. Transmittion spectra

3. Results

3.1. Electron microscope photos of samples

3.2. Power dependence on angle of diffraction

3.3. Conditions for optimal sample quality

4. Literature

4.1. Lloyd's mirror interference litography

4.2. Surface plasmon resonance

5. Conclusions

5.1. Recomendations for future work

5.2. Result Review